“四氯化硅質(zhì)量分?jǐn)?shù)/%95.0三氯氫硅烷質(zhì)量分?jǐn)?shù)/%4.5高沸物質(zhì)量分?jǐn)?shù)/%0.2低沸物質(zhì)量分?jǐn)?shù)/%0.3注:高沸物為沸點(diǎn)高于四氯化硅的其他雜質(zhì)。低沸物為沸點(diǎn)低于三氯氫硅烷的其它雜質(zhì)。試驗(yàn)方法除非另有說明,僅使用分析純試劑。
范圍:氣相二氧化硅生產(chǎn)用四氯化硅的技術(shù)要求、試驗(yàn)方法、檢驗(yàn)規(guī)則、標(biāo)志、包裝、運(yùn)輸、貯存和安全。 本標(biāo)準(zhǔn)適用于多晶硅副產(chǎn)四氯化硅、三氯氫硅副產(chǎn)四氯化硅以及其它方法制得的四氯化硅，該四氯化硅滿足氣相二氧化硅生產(chǎn)原料的質(zhì)量要求; 主要技術(shù)內(nèi)容:范圍、規(guī)范性引用、技術(shù)要求、試驗(yàn)方法、檢驗(yàn)規(guī)則、標(biāo)識、包裝、運(yùn)輸和貯存、安全
名稱：毛細(xì)管柱
固定相：二甲基聚硅氧烷
規(guī)格：30m*0.32mm*0.5um
型號：HH-1
應(yīng)用：T/FSI 003-2016 《氣相二氧化硅生產(chǎn)用四氯化硅》
Silicon tetrachloride mass fraction/% 95.0 trichlorosilane mass fraction/% 4.5 high boiling substance mass fraction/% 0.2 low boiling substance mass fraction/% 0.3 Note: High boiling substance refers to other impurities with a boiling point higher than silicon tetrachloride. Low boiling substance refers to other impurities with a boiling point lower than trichlorosilane. Unless otherwise specified, only analytical pure reagents are used for the test method.
Scope: Technical requirements, test methods, inspection rules, marking, packaging, transportation, storage, and safety of tetrachlorosilane used in the production of gas-phase silica. This standard applies to polycrystalline silicon by-product tetrachloride, trichlorosilane by-product tetrachloride, and other methods of producing tetrachloride silicon, which meets the quality requirements of raw materials for the production of fumed silica; Main technical content: scope, normative references, technical requirements, test methods, inspection rules, identification, packaging, transportation and storage, safety
Name: Capillary Column
Fixed phase: dimethyl polysiloxane
Specification: 30m * 0.32mm * 0.5um
Model: HH-1
Application: T/FSI 003-2016 "Tetrachlorosilane for the production of fumed silica"
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